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    • 產品名稱: PVD1012硬質鍍膜設備

    主要技術參數與配置:

    1.真空室容積:φ1000*1200mm      
    2.有效鍍膜區:φ700*850mm
    3.可移出式轉架:無需定位,可任意位置移出,傳動可靠(專利技術)
    4.陰極電?。?phi;160mm或φ140mm雙驅動動態磁控陰極電弧*8
    5.IET離子刻蝕源

    Configuration:

    Ⅰ.Vacuum chamber volume:Φ1000mm*h1200mm    
    Ⅱ.Effective coating area:Φ700*850mm
    Ⅲ.Carousel:Removable
    Ⅳ.Φ160mm or Φ140mm dynamic magnetically controlled cathode arc*8
    Ⅴ.IET *1

    技術特點:

    該系列采用動態雙驅動磁控陰極電弧技術,離化率高??芍苽銽iN、CrN、TiAlN、AlTiN、AlCrN、AlCrSiN等單層或多層膜系。高效的涂層前離子刻蝕技術,保證了涂層的結合力及性能。該系列設備在鍍膜過程中無需打底層(過渡層),直接成膜,沉積效率高。

     Technical feature:

    The series adopts dynamic dual drive magnetron cathodic arc technology with high ionization rate. Monolayer or multilayer films such as TiN, CrN, TiAlN, AlTiN, AlCrN and AlCrSiN can be made.High efficiency pre-coating IE technology ensures the adhesion and performance of the coating. This series of equipment does not need to make the bottom layer (transition layer) in the process of coating, directly forming the film, and has high deposition efficiency.

    土地配资是什么意思