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    • 產品名稱: PVD1112硬質鍍膜設備

    主要技術參數與配置:
     

    1.真空室容積:φ1100*1200mm
    2.有效鍍膜區:φ700*850mm
    3.可移出式轉架:無需定位,可任意位置移出,傳動可靠(專利技術)
    4.陰極電?。?phi;160mm或φ140mm雙驅動動態磁控陰極電弧*12
    5.IET離子刻蝕源:1套

    Configuration:

    Ⅰ.Vacuum chamber volume:Φ1100mm*h1200mm
    Ⅱ.Effective coating area:Φ700*850mm
    Ⅲ.Carousel:Removable
    Ⅳ.Φ160mm or Φ140mm dynamic magnetically controlled cathode arc*12
    Ⅴ.IET *1

    技術特點:

    該設備在PVD1012硬質涂層設備(8?。┑幕A上進行升級,陰極電弧的數量升級為12個(3組)??芍苽涓嗄は?。多種工藝選擇,可滿足用戶的各種需求。PVD1112的設計讓現場維護和保養十分方便,系統可以從兩側打開,所有系統部件都伸手可及。
     
    Technical feature:

    The equipment is upgraded on the basis of PVD1012 hard coating equipment (8 arcs), and the number of cathode arcs is upgraded to 12 (3 sets).More coating type are available. A variety of process options can meet the needs of users.The design of PVD1112 is very convenient for on-site maintenance. The system can be opened from both sides, and all the components of the system can be reached.

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